According to the invention there is provided a method of manufacturing a plurality of silicon microneedles which have a bevelled tip, the method comprising the steps of:providing a silicon substrate having a front face and a rear face；forming a first mask arrangement on the front face of the substrate, the first mask arrangement defining one or more gaps；performing a SF6 based plasma etch of the front face through the gaps in the first mask arrangement to provide one or more etch features having a sloping face, wherein the SF6 based plasma etch undercuts the first mask arrangement with an undercut that is at least 10% of the depth of a corresponding etch feature；forming a second mask arrangement on the etch features to define locations of the microneedles, in which the second mask arrangement is located entirely on sloping faces of the etch features ； andperforming a DRIE (deep reactive ion etch) anisotropic plasma etch of the etched front face of the substrate to form a plurality of microneedles which have a bevelled tip, wherein the sloping faces of the etch features at least in part give rise to the bevelled tips of the microneedles.
