ENHANCED PHOTOSTABILITY, EXTENDED RANGE UVA FILTERING AND CAMOUFLAGING POTENTIAL OF AVOBENZONE-DEFECT RICH ZNO NANOCRYSTALS COMPLEX

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专利权人:

发明人:

ADERSH ASOK,AJIT R KULKARNI

申请号：

IN3310/MUM/2015

公开号：

IN2015MU03310A

申请日:

2015.08.29

申请国别(地区):

IN

年份:

2017

代理人:

摘要：

This present disclosure relates to the use of Avobenzone-defect rich ZnO nanocrystals complex as multifunctional active ingredient in sunscreen, cosmetic and dermatological compositions, and more particularly to photostable sunscreen compositions and their use in improving the UV protection, aesthetic and natural appearance of the biological surface. The complex Av-DZnONCs shows improved photostability and extended UVA filtering as opposed to sunscreen formulations containing only ZnO or Avobenzone.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/