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COSMETIC SOLUTION, METHOD FOR PRODUCING COSMETIC SOLUTION, AND COSMETIC METHOD
专利权人:
Yukako Sugawara
发明人:
Yukako Sugawara
申请号:
US14116594
公开号:
US20140088040A1
申请日:
2012.04.17
申请国别(地区):
US
年份:
2014
代理人:
摘要:
Provided are a cosmetic solution and a method for producing the cosmetic solution, the cosmetic solution being easy to store and also easy to handle during use, and moreover having a high moisturizing function, without the use of a preservative. Hyaluronic acid/or a hyaluronic acid compound is dispersed in a polyvalent alcohol, also, an organic acid and/or organic acid salt different from the hyaluronic acid and/or hyaluronic acid compound is dispersed in a polyvalent alcohol such that it contains no water. The solution contains 0.01 to 2.0 wt % hyaluronic acid and/or hyaluronic acid compound 97 wt % or more polyvalent alcohol, is weakly acidic i.e. 5≦pH<7 due to the organic acid and/or organic acid salt.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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