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Generating and visualizing an ion beam profile
专利权人:
Shettihalli Murali
发明人:
Shettihalli Murali
申请号:
US12333741
公开号:
US08173979B2
申请日:
2008.12.12
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A method for generating and visualizing an ion beam profile is provided. The method includes specifying an incidence direction of a particle beam, specifying a target region that is to be irradiated by said particle beam, creating an ion beam profile from points that are located on a downstream side of the target region or that are located in front of the target region and project onto the contour of the target region with respect to the incidence direction, and displaying a graphical representation of the ion beam profile.
来源网站:
中国工程科技知识中心
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