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SYSTEMS AND METHODS FOR REDUCING SCAR FORMATION ABOUT A NEURAL IMPLANT
专利权人:
发明人:
Kevin C. Spencer,Jay Christopher Sy,Michael J. Cima
申请号:
US15172464
公开号:
US20160354034A1
申请日:
2016.06.03
申请国别(地区):
US
年份:
2016
代理人:
摘要:
Systems, devices, and methods are provided for reducing scar formation about a neural implant due to brain tissue and neural implant movement. In an embodiment, a neural implant is provided which has a surface coating that matches one or more mechanical properties, such as elastic modulus, of the brain tissue, thereby reduce scar formation about the neural implant due to normal brain micromotion.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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