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具有應用水份管理加工的織物結構布
专利权人:
HONHAO TECHTEXTILE CO.; LTD.
发明人:
蔡桂财,蔡桂財
申请号:
TW108216260
公开号:
TWM596162U
申请日:
2019.12.05
申请国别(地区):
TW
年份:
2020
代理人:
摘要:
This creative department is a fabric structure fabric with application of moisture management processing. Its main structure consists of moisture management processing layer, fabric layer and skin layer. The moisture management processing fabric layer system includes (1). The upper layer is The bottom layer (back surface) is a fabric layer, the surface layer (front surface) is a moisture management processing layer, and the lower layer is a skin layer. (2). The top layer is the surface layer (front side) is the fabric layer, the bottom layer (back side) is the moisture management processing layer, and the bottom layer is the skin layer. (3). The upper layer is the bottom layer (back side) is the fabric layer, the surface layer (front side) is the moisture management processing layer + the fabric pattern layer, and the lower layer is the skin layer. (4). The upper layer is the surface layer (front surface) is the fabric layer, the bottom layer (back surface) is the moisture management processing layer + fabric pattern layer, and the lower layer is the skin layer. The fabric of this creative structure is characterized by the moisture management processing that affects the texture of the fabric presentation surface or the pattern presentation surface and the feel of the skin.本創作係為一種具有應用水份管理加工的織物結構布,其主要結構包括有水份管理加工層、織物層及皮膚層所組成,其中水分管理加工織物層係包括有(1).上層為底層(背面)為織物層、表層(正面)為水份管理加工層,下層為皮膚層。(2).上層為表層(正面)為織物層、底層(背面)為水份管理加工層,下層為皮膚層。(3).上層為底層(背面)為織物層、表層(正面)為水份管理加工層+織物花紋層,下層為皮膚層。(4).上層為表層(正面)為織物層、底層(背面)為水份管理加工層+織物花紋層,下層為皮膚層。本創作結構布係作為水份管理加工影響織物呈現面或花紋呈現面的織物與肌膚的觸感為特性。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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