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Skin cleansing composition
专利权人:
Kao Corporation
发明人:
Mayuko Hirahara,Koji Endo,Kenji Kaneda,Masahiro Miyaki
申请号:
US13727336
公开号:
US08940673B2
申请日:
2012.12.26
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention provides a skin cleansing composition comprising the following components (A), (B), and (C):(A) (a1) an alkenylsulfonic acid having 12 to 22 carbon atoms or its salt, (a2) an alkylsulfonic acid having 12 to 22 carbon atoms or its salt, or a mixture of them,(B) an alkyl ether carboxylic acid represented by the following formula (1) or its salt:R1—O—(CH2CH2O)n—CH2—COOX  (1)wherein R1 represents an alkyl group having 4 to 22 carbon atoms, n denotes a number from 0 to 20, X represents a hydrogen atom, an alkali metal, an alkali earth metal, ammonium, or organic ammonium, and n denotes a number of 0.5 or more and less than 4 on average; and(C) water.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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