Chemical vapor infiltration apparatus and process

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专利权人:

Zimmer; Inc.

发明人:

Joseph R. Vargas,Steven Seelman,David B. Roberts

申请号：

US14620287

公开号：

US09277998B2

申请日:

2015.02.12

申请国别(地区):

US

年份:

2016

代理人:

摘要：

The present invention relates to improvements in chemical vapor infiltration processes and devices for depositing a biocompatible material onto a porous substrate to form an orthopedic implant. The substrate may be formed of reticulated vitreous foam and coated with tantalum, niobium, tungsten, or other biocompatible materials.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/