ANDREAS HELMKE,DIRK WANDKE,KARL-OTTO STORCK,LEONHARD TRUTWIG,MATTHIAS KOPP,MIRKO HAHNL
申请号：
BR112017021958
公开号：
BR112017021958A2
申请日:
2016.06.16
申请国别(地区):
BR
年份:
2018
代理人:
摘要：
The present invention relates to a treatment apparatus for a surface to be treated using a dielectrically hindered plasma comprising a housing (1) having a front wall (14, 14 ') and comprising an electrode (18, 33) which It is protected from the surface to be treated by a dielectric (19, 34) forming at least a portion of the front wall (14, 14 ') and which can be connected to a high voltage generator (17). the front wall (14, 14 ') has at least one spacer (29, 29') through which at least one gas chamber is formed when said at least one spacer (29, 29 ') abuts against the surface to be treated, and dielectrically hindered plasma is formed in the gas chamber for the treatment process. the treatment apparatus simultaneously permits treatment using the dielectrically hindered plasma and metered supply of a treatment agent in which a reservoir chamber (25.25 ') that can be filled with a treatment agent is disposed on the front wall (14). 14 ') opposite the surface to be treated； the front wall (14, 14 ') has through-openings (28, 28')； and the volume of the reservoir chamber (25,25 ') may be reduced so that the treating agent reaches the region of the surface to be treated through the through openings (28,28') when the volume is reduced.a presente invenção refere-se a um aparelho de tratamento para uma superfície a ser tratada utilizando um plasma dieletricamente impedido, compreendendo um alojamento (1) que tem uma parede frontal (14, 14') e compreendendo um eletrodo (18, 33) que está protegido da superfície a ser tratada por um dielétrico (19, 34) que forma pelo menos uma parte da parede frontal (14, 14') e que pode ser conectado a um gerador de alta tensão (17). a parede frontal (14, 14') tem pelo menos um espaçador (29, 29') por meio do qual pelo menos uma câmara de gás é formada quando o dito pelo menos um espaçador (29, 29') encosta contra a superfície a ser tratada, e o plasma dieletricamente impedido é formado na câmara de gás para o processo de tratamento. o apa
