PROBLEM TO BE SOLVED: To provide a gas treatment apparatus capable of efficient treatment of gas.SOLUTION: A gas treatment apparatus according to an embodiment includes: first and second dielectric substrates facing each other； first and second discharge electrodes respectively disposed on a pair of principal surfaces facing each other, of the first and second dielectric substrates； first and second ground electrodes respectively disposed on a pair of principal surfaces opposite to the pair of principal surfaces having the first and second dielectric substrates； a gas flow path for supplying gas to be treated to a part between the first and second discharge electrodes； an AC power supply for applying AC voltage between the first and second discharge electrodes and the first and second ground electrodes respectively, thus creating electric discharge of the gas to be treated, and generating first and second plasma induced flows； and an area disposed between the first and second dielectric substrates, and downstream of the first and second discharge electrodes, where an interval between the first and second dielectric substrates is 1.3 times or shorter than the total sum of thicknesses of the first and second plasma induced flows.【課題】効率的なガスの処理を可能とするガス処理装置を提供する。【解決手段】実施形態のガス処理装置は，互いに対向する第１、第２の誘電体基板と、前記第１、第２の誘電体基板の対向する一対の主面上それぞれに配置される第１、第２の放電電極と、前記第１、第２の誘電体基板の前記一対の主面と反対側の一対の主面上それぞれに配置される第１、第２の接地電極と、前記第１、第２の放電電極間に被処理ガスを供給するガス流路と、前記第１、第２の放電電極と前記第１、第２の接地電極との間それぞれに交流電圧を印加することで、前記被処理ガスを放電させ、第１、第２のプラズマ誘起流を生成する交流電源と、前記第１、第２の放電電極の下流の前記第１、第２の誘電体基板間に配置され、前記第１、第２の誘電体基板の間隔が、前記第１、第２のプラズマ誘起流の厚さの合計の１．３倍以下である領域と、を備える。【選択図】図１
