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DISPOSITIF ET PROCEDE DE GENERATION DE PLASMA
专利权人:
TOYO ADVANCED TECHNOLOGIES CO.; LTD.
发明人:
SATO, TAKEHIKO,NAKATANI, TATSUYUKI,KIMURA, TATSUO
申请号:
EP06782697
公开号:
EP1933605A4
申请日:
2006.08.11
申请国别(地区):
EP
年份:
2014
代理人:
摘要:
[Objective] To provide a method and system for surely and conveniently generating plasma in a narrow tube having a small diameter. [Solution] The first electrode 30 formed by a conductive member covered with an insulator or dielectric is inserted into the narrow tube 10. The narrow tube 10 is located on the second electrode 20. The power supply 40 applies an alternating voltage or pulse voltage between the first electrode 30 and the second electrode 20 so that plasma is generated in the narrow tube 10 around the first electrode 20.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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