ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、表示体装置、およびポジ型感光性樹脂組成物の製造方法

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专利权人:

住友ベークライト株式会社

发明人:

池田 拓司,中原 卓郎

申请号：

JP20130132113

公开号：

JP6255740(B2)

申请日:

2013.06.24

申请国别(地区):

日本

年份:

2018

代理人:

摘要：

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which allows formation of a positive pattern with high sensitivity and high resolution and which has sufficient resistance to a strong alkali aqueous solution, heat resistance and mechanical characteristics as a cured film when used for such purposes as a surface protective film and an interlayer insulation film.SOLUTION: A positive photosensitive resin composition is provided, comprising an alkali-soluble resin (A), a photoacid generator (B), and a solvent (C). The positive photosensitive resin composition after cured shows a glass transition temperature of 200°C or higher and an inner stress of 40 MPa or less.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/