A device for thermally treating a pourable plant product includes a receiving device configured to receive the pourable plant product and a gas supply channel configured to supply a heated gas to the receiving device. The gas supply channel is divided directly upstream of the receiving device, in a gas flow direction, into a first gas supply sub-channel and a second gas supply sub-channel which follow each other in a direction of gravity, and which are configured to supply the heated gas to the receiving device. A cross section of at least the first gas supply sub-channel is configured to be closed or reduced before the receiving device independently of the second gas supply sub-section so as to eliminate or reduce a volume of the heated gas to the receiving device via the first gas supply sub-channel.
