您的位置: 首页 > 农业专利 > 详情页

QUICK-RESPONSE RESISTIVE SENSOR OF EXPOSABLE CONCENTRATIONS OF HYDROGEN ( VARIANTS ) AND PROCESS OF ITS MANUFACTURE
专利权人:
发明人:
NIKOLAEV I.N.,NIKOLAEVA A.I.,DETININA O.I.
申请号:
RU20020130840
公开号:
RU2221241(C1)
申请日:
2002.11.19
申请国别(地区):
俄罗斯
年份:
2004
代理人:
摘要:
FIELD: measurement technology, measurement of concentrations of hydrogen. SUBSTANCE: invention can find use in manufacture of gas analyzers of exposable concentrations of hydrogen in spacecraft equipment, in automotive and chemical industries. Technical result of invention lies in increase of response of sensor up to 0.1 s. Proposed quick-response resistive sensor of exposable concentrations of hydrogen ( over 1.0 per cent by volume ) has insulation substrate, hydrogen-sensitive thin-film element applied to substrate, heating element that heats hydrogen-sensitive thin-film element. Hydrogen-sensitive thin-film element is fabricated from material containing palladium subjected to thermal treatment to ensure formation of palladium oxide or from palladium oxide changing into metal palladium under action of hydrogen. In correspondence with another variant manufacture of hydrogen-sensitive thin-film resistive sensor of exposable concentrations of hydrogen consists in formation of thin metal film on insulation subs
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充