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HYDROPONIC CULTURE METHOD FOR PLANT IN HIGH SALINITY ENVIRONMENT
专利权人:
SEKISUI CHEMICAL CO.; LTD.
发明人:
Seigo ONO,Toshimasa TAKEUCHI,Setsuo NAKAJIMA,Koichiro IWASA,Makoto FUJIGAMI
申请号:
US15774357
公开号:
US20200245576A1
申请日:
2016.12.14
申请国别(地区):
US
年份:
2020
代理人:
摘要:
The present invention provides a plant cultivation method, which enables plant cultivation under high salinity environment for a long time. A method for hydroponic plant cultivation under high salinity environment, comprising a cultivation step of hydroponically growing a plant with a cultivation solution having a sodium chloride concentration of 1% by mass or more, during which a salt resistance imparting treatment is performed at least once by bringing a salt tolerance imparting agent into contact with at least a part of a root of the plant, thereby maintaining salt tolerance of the plant.
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