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Light source control system for plant factory
专利权人:
发明人:
최원영
申请号:
KR1020110062168
公开号:
KR1012786960000B1
申请日:
2011.06.27
申请国别(地区):
KR
年份:
2013
代理人:
摘要:
The present invention relates to a plant factory, and more specifically, to a system which controls light sources for a plant factory in order to optimize the growth of plants. According to the present invention, a light source control system for a plant factory comprises: light sources which have different spectral distributions, and irradiate light toward plants in a cultivation area; a reference reflecting plate which is installed in said cultivation area, and reflects the light incident from said light sources; and a camera which measures ratios of the intensity in each wavelength region of the light reflected from said reference reflecting plate. According to the present invention, the light source control system for the plant factory controls the light sources after measuring the ratios of the intensity in each wavelength region of the light irradiated on the plants in real time, thereby maintaining optimized spectral distributions regardless of the duration of usage or changes in ambient temperature.본 발명은 식물공장에 관한 것으로서, 더욱 상세하게는 식물의 성장을 최적화하기 위해 식물공장용 광원을 제어하는 시스템에 관한 것이다. 본 발명에 따르면, 서로 다른 분광분포를 가지며, 재배공간의 식물을 향해서 빛을 조사하는 광원들과, 상기 재배공간에 설치되어 상기 광원들에서 입사된 빛을 반사하는 레퍼런스 반사판과, 상기 레퍼런스 반사판에서 반사된 빛의 파장 영역별 강도의 비를 측정하는 카메라를 포함하는 식물공장용 광원 제어시스템이 제공된다.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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