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HAUTZUSTANDSMESSVORRICHTUNG MIT VERWENDUNG MEHRERER LICHTQUELLEN
专利权人:
Park; Chang Sik
发明人:
Park, Chang Sik
申请号:
EP18869837
公开号:
EP3533388A4
申请日:
2018.06.11
申请国别(地区):
EP
年份:
2020
代理人:
摘要:
A skin state measuring apparatus using a multi-wavelength light source is provided. The apparatus includes a casing configured to allow light of different wavelengths to be selectively irradiated in one direction onto a skin, in contact with the skin at a measurement position by shielding light emitting positions, a reflective capturing unit disposed inside the casing, and configured to capture the skin irradiated with light, while selectively irradiating visible light, ultraviolet (UV) light, and infrared (IR) light as reflection-based indirect light onto the skin in the one direction, a direct light sensing unit disposed inside the casing, at one side of the reflective capturing unit, and configured to sense a state of the skin, while irradiating the skin with direct light emitted from the reflective capturing unit and passed therethrough, a control unit disposed inside the casing, and configured to control capturing and transmission of an image by controlling the reflective capturing unit and the direct light emitting unit to irradiate light selected from among the visible light, the UV light, and the IR light in the form of indirect light onto the skin and to irradiating penetrate direct light onto the skin according to the state of the skin, and a capture analysis unit disposed at one side of the casing, coupled electrically to the control unit, and configured to synthesize images captured by the control unit according to the state of the skin and analyze the synthesized image by color and shape comparison.
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中国工程科技知识中心
来源网址:
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