Nail Enamel Composition

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专利权人:

Dariush Hosseinpour

发明人:

Dariush Hosseinpour,Heng Cai

申请号：

US14323462

公开号：

US20160000675A1

申请日:

2014.07.03

申请国别(地区):

US

年份:

2016

代理人:

摘要：

The present invention is directed to a nail enamel composition that includes a photoinitiator, a co-initiator, and an oligomer. The nail enamel composition exhibits increased hardness, toughness, scratch resistance, adhesion, and chip resistance when applied to a natural or synthetic nail.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/