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Block copolymers and their use
专利权人:
Son Nguyen Kim
发明人:
Son Nguyen Kim,Wolfgang Jahnel
申请号:
US13039155
公开号:
US08673275B2
申请日:
2011.03.02
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A process of free-radical copolymerization of a monomer composition comprising: a) 70 to 100% by weight of acrylic acid, b) 0 to 30% by weight of at least one hydrophilic nonionic compound, different from a), having a free-radically polymerizable, α,β-ethylenically unsaturated double bond, c) 0 to 1% by weight of at least one free-radically polymerizable crosslinking compound which comprises at least two α,β-ethylenically unsaturated double bonds per molecule, by the method of precipitation polymerization in the presence of an auxiliary composition H) comprising H1) at least one compound with a block structure which comprises at least one hydrophobic group and at least one hydrophilic group, and H2) at least one basic compound different from H1).
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