A shield structure for electron beam sterilization equipment has outer-surface and inner-surface sterilization zones (Z2, Z3) that project electron beams into a container, and are located in first through third shield chambers (R1-R3) for housing first through third revolving channels (L1-L3). An exit trap zone (Z4) connected to the inner-surface sterilization zone (Z3) has fourth through sixth shield chambers (R4-R6) for housing fourth through sixth revolving channels (L4-L6). First through third inner-circumferential shields (S1-S3) are positioned along the inner-circumferential sections of the first through third revolving channels (L1-L3). Fourth and fifth inner-circumferential shields (S4, S5) are positioned along the inner-circumferential sections of the fourth and fifth revolving channels (L4-L5). At least one of the following conditions is satisfied: a condition (I) in which the outer diameter (D5) of the inner-circumferential shield (S5) is larger than the outer diameter (D4) of the inner-circumferential shield (S4)； and a condition (II) in which the outer diameter (DT2) of an inner-circumferential shield (ST2) in a revolving channel (LT2) on the downstream side of an entrance trap zone (Z1) connected to the outer-surface sterilization zone (Z2) is larger than the outer diameter (D1) of the inner-circumferential shield (S1) in the revolving channel (L1) on the upstream side of the outer-surface sterilization zone (Z2).La présente invention concerne une structure de blindage pour équipement de stérilisation par faisceaux d'électrons comprenant des zones de stérilisation en surface externe et interne (Z2, Z3) projetant des faisceaux d'électrons à l'intérieur d'un récipient, et situées dans des première à troisième chambres de blindage (R1 à R3) destinées à loger le premier au troisième canal rotatif (L1 à L3). Une zone de piégeage en sortie (Z4) connectée à la zone de stérilisation en surface interne (Z3) est dotée d'une quatrième à une sixième chambres de bl
