JUAN PABLO PIVEL RANIERI,JOSE LUIS ALONSO LEBRERO,SALVADOR GONZALEZ RODRIGUEZ,MADHUKAR A. PATHAK,FERNANDO GARCIA MARTINEZ,ANTONIO GUERRERO GOMEZ-PAMO,MARTA DOMINGUEZ VALDES-HEVIA,AURORA MA BRIEVA DELG
申请号：
PT04725071
公开号：
PT1762219E
申请日:
2004.04.01
申请国别(地区):
PT
年份:
2013
代理人:
摘要：
The composition comprises of a component A selected from a hydroxylated derivative of benzoic acid or of cinamic acid, their esters, amides or salts, a glycoside of a hexose, and their mixtures； and a component B selected from quinic acid, shikimic acid, their alkaline metal or alkaline earth salts, their methyl esters, and mixtures of the same. This composition is suitable for protecting the skin against ultraviolet radiation coming from the sun or artificial sources, such as those used in phototherapy units and in sun tanning rooms. For application in the field of dermatology and nutrition, and, in particular, in the photoprotection of the skin and mucosa, photo-ageing and photocarcinogenesis, including protection of the immune system associated with the skin.
