SCHMITT-WEAVER Emil Peter,STÄCKER Jens,SCHREEL Koenraad Remi André Maria,WERKMAN Roy
申请号：
US201615736451
公开号：
US2018173118(A1)
申请日:
2016.05.27
申请国别(地区):
美国
年份:
2018
代理人:
摘要：
A first substrate (2002) has a calibration pattern applied to a first plurality of fields (2004) by a lithographic apparatus. Further substrates (2006, 2010) have calibration patterns applied to further pluralities of fields (2008, 2012). The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substrates (2002, 2006, 2010) and used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (2004, 2008, 2012) is gathered together in a database (2013) and used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.
