Chad J. Patterson,Mark E. Berg,Peter F. Ullrich, Jr.
申请号：
US14934675
公开号：
US09655745B2
申请日:
2015.11.06
申请国别(地区):
US
年份:
2017
代理人:
摘要：
A method of producing an interbody spinal implant. The method includes the steps of obtaining a blank having a top surface, bottom surface, opposing lateral sides, and opposing anterior and posterior portions, and applying a subtractive process (e.g., masked acid etching) to the top surface, the bottom surface, or both surfaces of the blank to form a roughened surface topography. Subsequently, the blank is machined to form the interbody spinal implant, which includes a body having a top surface, a bottom surface, opposing lateral sides, opposing anterior and posterior portions, a substantially hollow center, and a single vertical aperture where the top surface, the bottom surface, or both surfaces of the interbody spinal implant have the roughened surface topography produced by the subtractive process. This simplified method produces more accurate and repeatable implants with fewer process steps and defects, reducing process time and costs.
