The present invention is a non-invasive treatment device 100 for heating a first inner region 15 and a second inner region 25 of skin using rf current, wherein the rf current is a first The first rf treatment electrode 10, configured to allow flow through the inner region 15 to the return electrode 340, and rf current flow through the second inner region 25 to the return electrode 340. A second rf treatment electrode 20 configured to allow the device to further reduce the minimum distance between the first rf treatment electrode 10 and the return electrode 340 The electrical skin contact area of the return electrode 340 is configured to be shorter than the minimum distance between the rf current 20 and the return electrode 340, and the electrical skin contact area of the first rf treatment electrode 10 is 5 times or more. Yes, second rf treatment electrode 2 Galvanic skin contact area is five times or more electrical skin contact area of the first rf treatment electrode 10, to provide a treatment device. By incorporating the second treatment electrode and the first treatment electrode in the same device, the positional relationship between the heated first region and the second region is fixed or at least more predictable. It becomes possible. With proper configuration, these areas can be matched to a smaller or greater degree. In some cases, the configuration may allow the same skin condition to be treated using heating of the first and second inner regions without moving the device over the skin. By providing an electrical skin contact area of the return electrode that is at least five times larger than the electrical skin contact area of the first rf treatment electrode, the position heated by the rf current is closer to the first treatment electrode, and the return Reduce the possibility of unwanted hot spots in the vicinity of the electrodes.本発明は、ｒｆ電流を用いて皮膚の第１の内側領域１５及び第２の内側領域２５を加熱するための非侵襲型処置装置１００であって、該装置は、ｒｆ電流が、第１の内側領域１５を通ってリターン電極３４０へと流れることを可能とするよう構成された、第１のｒｆ処置
