An apparatus for personal aesthetic skin treatment by RF voltage. The apparatus includes an RF voltage supply and a disposable patch with an assembly of individual electrodes operative to contact segments of the skin and deliver to each contact RF voltage. The RF voltage may be supplied to each of the electrodes according to a predetermined experimentally established skin treatment protocol. The treatment RF current generated by the applied RF voltage heats the skin and is applied intermittently to different electrodes being in contact with the skin in an order and duration sufficient to cause the desired skin effect and enable proper cooling of earlier treated skin segments. The selected protocol ensures safe non-ablative skin treatment parameters.
