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照射模片裝置、治療計畫裝置及粒子線治療裝置
专利权人:
MITSUBISHI ELECTRIC CORPORATION
发明人:
OTANI, TOSHIHIRO,大谷利宏,HANEDA, HIDEKI,羽田英树,羽田英樹
申请号:
TW105110722
公开号:
TW201701922A
申请日:
2016.04.06
申请国别(地区):
TW
年份:
2017
代理人:
摘要:
An objective of the present invention is to obtain a bolus device for repeatedly using, a therapy planning device for making constitution data of the bolus device and a particle beam therapy device equipped with the bolus device. A bolus device (10) of the present invention, which is disposed on a front end of a particle beam therapy device (58) for irradiating a charged particle beam (16) that is accelerated by an accelerator (54) to an irradiated object (affected area (100T)), comprises at least one of the following: a basic bolus (thin type bolus (1)) that can be used in a different irradiated object (affected area (100T)) and has a cavity (2) or a basic bolus (76, 89) constituted by components of the same shape, wherein the basic bolus (thin type bolus (1)) adjusts the range of the charged particle beam (16) passes through the basic bolus (thin type bolus (1)) to the form a shape in a depth direction in the irradiation field irradiated by the charged particle beam (16).本發明之目的在得到可重複使用的照射模片裝置、用來製作出照射模片裝置的構成資料之治療計畫裝置、以及具備有照射模片裝置之粒子線治療裝置。本發明之照射模片裝置(10),係設於將經加速器(54)予以加速過的帶電粒子束(16)照射至照射對象(患部(100T))之粒子線治療裝置(58)的前端側之照射模片裝置(10),具備有至少一個可使用於不同的照射對象(患部(100T))且具備凹部(2)之基本照射模片(薄型照射模片(1))、或將相同形狀部件組合而成之基本照射模片(76,89),基本照射模片(薄型照射模片(1))係調整通過該基本照射模片(薄型照射模片(1))之帶電粒子束(16)的射程,形成帶電粒子束(16)照射的照射範圍的深度方向的形狀。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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