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DISPOSITIF D'HYPERTHERMIE À RADIOFRÉQUENCE À DOUBLE SYSTÈME D'ADAPTATION D'IMPÉDANCE
专利权人:
Oncotherm Kft.
发明人:
申请号:
EP16165109.6
公开号:
EP3231478A1
申请日:
2016.04.13
申请国别(地区):
EP
年份:
2017
代理人:
摘要:
The present invention relates to a radiofrequency (RF) hyperthermia device comprising a radiofrequency carrier signal generator (1), a radiofrequency amplifier (4), an electrode (6) and a counter-electrode (7), a first impedance measuring means (2), a first impedance matching means (3), a second impedance measuring means (5), and at least one second impedance matching means (8 or 8'), wherein the at least one second impedance matching means is configured and adapted to match the second impedance measured by the second impedance measuring means to the predetermined value. This radiofrequency (RF) hyperthermia device is designed for the hyperthermia treatment by optimized double impedance matching system.
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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