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Siloxane removal via silicate formation for lifetime extension of photocatalytic devices
专利权人:
Tania Bhatia;Treese Campbell-Hugener;Wayde R. Schmidt
发明人:
Wayde R. Schmidt,Treese Campbell-Hugener,Tania Bhatia
申请号:
US12669311
公开号:
US08883084B2
申请日:
2007.07.31
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A photocatalytic device for reacting with volatile organic compounds includes a photocatalyst and at least one additive, such as hafnium oxide and zirconium oxide, that is capable of forming a stable silicate with silicon dioxide. The additive reacts with volatile silicon-containing compounds to form stable silicate compounds. As a result, the silicon-containing compounds are unavailable for deactivation of the photocatalyst.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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