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NEW ANTIMICROBIAL COMPOSITIONS AND USES THEREOF
专利权人:
发明人:
Dominic Tessier,Martin Filteau,Ion Radu
申请号:
US14672566
公开号:
US20150201622A1
申请日:
2015.03.30
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention concerns solutions having an antimicrobial activity. The solutions described herein comprise particles containing slightly soluble metallic salt and surfactant. In the solutions described herein, the molar ratio between the slightly soluble metallic salt and the surfactant is lower than or equal to about 1. Also described are substrates comprising the solutions, methods for producing substrate comprising the solutions, methods for producing the solutions and uses of the solutions for substrate finishing and substrate sanitization.
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