The present invention relates to an apparatus and a method of controlling impedance matching for a very high-frequency treatment device. According to the present invention, impedance in a very high-frequency treatment device and impedance in a body of a subject are matched, such that the output of very high-frequency is stably maintained while very high-frequency treatment is performed, thereby enhancing a treatment effect. The apparatus of controlling impedance matching for a very high-frequency treatment device is provided in the very high-frequency treatment device including a very high-frequency emitter for emitting a very high-frequency to the skin. The apparatus of controlling impedance matching for a very high-frequency treatment device includes a first variable capacitor measuring impedance in the very high-frequency treatment device, and a second variable capacitor measuring impedance in the body of a subject. The apparatus of controlling impedance matching for a very high-frequency treatment device further comprises: an initial setting unit fixing capacitance values of the first variable capacitor and the second variable capacitor to respective predetermined capacitance values and setting directions of the first variable capacitor and the second variable capacitor； an impedance matching unit calculating an initial standing wave ratio value when the capacitance values of the first variable capacitor and the capacitance values of the second variable capacitor are modified, and matching of the impedance in the very high-frequency treatment device and the impedance in the body of a subject is initially performed； and an impedance matching control unit controlling the matching of the impedance in the very high-frequency treatment device and the impedance in the body of a subject by modifying the capacitance value of the first variable capacity according to a matching state of the impedance in the current very high-frequency treatment device and the impedance in
