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眼科測定装置
专利权人:
株式会社ニデック
发明人:
羽根渕 昌明
申请号:
JP2006296566
公开号:
JP4988305B2
申请日:
2006.10.31
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
An ophthalmic measurement apparatus which measures wavefront aberration of a patients eye with high accuracy includes an irradiation optical system including a high-coherence measurement light source, a photo-receiving optical system including a light dividing element and a photodetector, a measurement light deflector placed in a position on an optical path of the irradiation optical system and not on that of the photo-receiving optical system, a memory storing deflection information and a pattern photo-received on the photodetector and associated with the information, and a control unit which drives the deflector to form patterns in different deflection states, controls the photodetector to photo-receive the patterns, reads out from the memory the information and the pattern, corrects the patterns based on their corresponding information by an amount of displacement of the read-out pattern with respect to a reference pattern, and performs addition to the corrected patterns so as to calculate the wavefront aberration.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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